✦ LIBER ✦
A sub-0.5 μm bilevel lithographic process using the deep-UV electron-beam resist p(si-cms)
✍ Scribed by A. E. Novembre; M. J. Jurek; A. Kornblit; E. Reichmanis
- Publisher
- Society for Plastic Engineers
- Year
- 1989
- Tongue
- English
- Weight
- 812 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0032-3888
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