A study using 13C CP/MAS NMR of microstructural changes in acrylate copolymers due to photolytic/SO2 degradation
✍ Scribed by R. J. Schadt; R. D. Gilbert; R. E. Fornes
- Publisher
- John Wiley and Sons
- Year
- 1991
- Tongue
- English
- Weight
- 545 KB
- Volume
- 43
- Category
- Article
- ISSN
- 0021-8995
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✦ Synopsis
Photolytic degradation (350 nm) of acrylate-type copolymer films in the presence of SOz and HzO has been examined using 13C CP/MAS NMR. Copolymers in this study are used as binders in the paint and adhesives industry. The compositions contain butyl acrylate, vinyl acetate, vinyl chloride, and methyl methacrylate units in various combinations. Elemental analyses of the samples allow comparisons and confirmations of structural changes observed in the NMR spectra. A significant result is identification of pendant sulfate group incorporation in UV/SOz or UV/S02/H,0-exposed VAc/BA-type copolymers which has been attributed to a co-unit interaction between BA and VAc units. It is suggested that effects on T8, the glass transition temperature, may account in part for this co-unit effect on photodegradation.