A study of the critical factor determining the size of etched latent tracks formed on SiO2 glass by swift-Cl-ion irradiation

✍ Scribed by Ken-ichi Nomura; Yoshimichi Ohki; Makoto Fujimaki; Xiaomin Wang; Koichi Awazu; Tetsuro Komatsubara

• Book ID: 113823304
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 365 KB
• Volume: 272
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2011.01.020