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A study of shallow and deep damage in Cu after implantation of 100 keV Cu and Ag ions

✍ Scribed by R.J.Th. Lindgreen; D.O. Boerma; J.Th.M. de Hosson

Publisher: Elsevier Science
Year: 1983
Weight: 298 KB
Volume: 209-210
Category: Article
ISSN: 0167-5087
DOI: 10.1016/0167-5087(83)90906-7

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