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A Study of Residual Strain in a K2O.6TiO2W/Al Composite by Using Convergent Beam Electron Diffraction

โœ Scribed by Bin Li; Huamin Zou; Jin Pan


Book ID
114388272
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
199 KB
Volume
38
Category
Article
ISSN
1359-6462

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Silicides, widely used as contacts in complementary MOS (CMOS) devices, are expected to introduce large distortions in the underlying silicon, which may have an impact on the device performances. In this work, we employed the convergent beam electron diffraction (CBED) technique in a TEM to map stre