A statistical yield optimization framework for interconnect in double patterning lithography

✍ Scribed by Minoo Mirsaeedi; Mohab Anis

• Book ID: 113798375
• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 364 KB
• Volume: 42
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/j.mejo.2011.08.006