A statistical model for electromigration induced failure in thin-film conductors : J. D. Venables and R. G. Lye. 10th IEEE Annual Proceedings, Reliability Physics (1972), p. 159

• Publisher: Elsevier Science
• Year: 1973
• Tongue: English
• Weight: 109 KB
• Volume: 12
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(73)90368-5