✦ LIBER ✦
A Simple Photomask with Photoresist Mask Layer for Ultraviolet-Photolithography and Its Application for Selectively Photochemical Surface Modification of Polymers
✍ Scribed by Kong Yong; Chen Heng-Wu; Yun Xiao; Hao Zhen-Xia; Fang Zhao-Lun
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- Chinese
- Weight
- 293 KB
- Volume
- 35
- Category
- Article
- ISSN
- 1872-2040
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