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A reliability study of insulated gate field effect transistors with an Al2O3-SiO2 gate structure : E. E. Lampi and E. F. Labuda. 10th IEEE Annual Proceedings, Reliability Physics (1972), p. 112


Publisher
Elsevier Science
Year
1973
Tongue
English
Weight
114 KB
Volume
12
Category
Article
ISSN
0026-2714

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