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A re-examination of practical performance limits of scaled n-channel and p-channel MOS devices for VLSI: Hisashi Shichijo. Solid-St. Electron.26 (10), 969 (1983)


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
132 KB
Volume
24
Category
Article
ISSN
0026-2714

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