A proposal for high resolution photolithography using optical limiters

✍ Scribed by A. Rostami; A. Rahmani

• Publisher: John Wiley and Sons
• Year: 2004
• Tongue: English
• Weight: 129 KB
• Volume: 1
• Category: Article
• ISSN: 1612-2011
• DOI: 10.1002/lapl.200410098

✦ Synopsis

The main problem of the traditional photolithography in
microelectronics and photonics Engineering (minimum line-width)
can be relaxed using optical limiters. In this work, nonlinear
Bragg Grating (Kerr-Like non-linearity) is used as an optical
limiter. Also, a suitable setup configuration for high-resolution
photolithography based on optical limiter is proposed. The minimum
line-width for integrated systems with our proposed configuration
depends on the Grating parameters. We show that, the linear and
nonlinear index of refractions profile, and the number of layers
in the proposed grating, determines the minimum line-width.