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A practical model for growth kinetics of thermal SiO2 on silicon applicable to a wide range of oxide thickness

✍ Scribed by Masayoshi Naito; auHideo Homma; Naohiro Momma


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
621 KB
Volume
29
Category
Article
ISSN
0038-1101

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