A plasma kinetics model: analysis of wall loss reactions in dry etching of silicon dioxide

✍ Scribed by Kazutami Tago; Hideyuki Kazumi; Kinya Kobayashi

• Book ID: 117624918
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 240 KB
• Volume: 279
• Category: Article
• ISSN: 0925-8388
• DOI: 10.1016/s0925-8388(98)00612-4