✦ LIBER ✦
A phenomenological model for surface deposition kinetics during plasma and sputter deposition of amorphous hydrogenated silicon: Mark J. Kushner,J appl Phys,62, 1987, 4763–4772
- Book ID
- 103470974
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 150 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0042-207X
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