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A Novel Trapping/Detrapping Model for Defect Profiling in High- Materials Using the Two-Pulse Capacitance–Voltage Technique

✍ Scribed by Aguado, D.R.; Govoreanu, B.; Zhang, W.D.; Jurczak, M.; De Meyer, K.; Van Houdt, J.


Book ID
114620148
Publisher
IEEE
Year
2010
Tongue
English
Weight
874 KB
Volume
57
Category
Article
ISSN
0018-9383

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