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A novel method of optical proximity correction using anti-reflective layers and individual photoresist characteristics

✍ Scribed by G. Arthur; B. Martin


Book ID
104306257
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
281 KB
Volume
35
Category
Article
ISSN
0167-9317

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✦ Synopsis


The optical proximity effect known as dense/isolated offset is investigated. The magnitude of this effect is found to be dependant upon resist type, film thickness and substrate reflectivity. It is shown that by the application of a bottom anti-reflective coating (ARC) and careful matching of the photoresist to the application, offset can be substantially eliminated.