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A novel heteroepitaxy method of Ge films on CaF2 by electron beam exposure: Seigo Kanemaru et al, J appl Phys, 63, 1988, 1060–1064


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
159 KB
Volume
39
Category
Article
ISSN
0042-207X

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