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A novel double ion-implant (DII) Ti-salicide technology for high-performance sub-0.25-μm CMOS devices applications

✍ Scribed by Kong-Beng Thei; Wen-Chau Liu; Hung-Ming Chuang; Kun-Wei Lin; Chin-Chuan Cheng; Chin-Hsiung Ho; Chi-Wen Su; Shou-Gwo Wuu; Chung-Shu Wang


Book ID
114538786
Publisher
IEEE
Year
2001
Tongue
English
Weight
97 KB
Volume
48
Category
Article
ISSN
0018-9383

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