✦ LIBER ✦
A novel approach to hedge and compensate the critical dimension variation of the developed-and-etched circuit patterns for yield enhancement in semiconductor manufacturing
✍ Scribed by Chien, Chen-Fu; Chen, Ying-Jen; Hsu, Chia-Yu
- Book ID
- 124125771
- Publisher
- Elsevier Science
- Year
- 2015
- Tongue
- English
- Weight
- 778 KB
- Volume
- 53
- Category
- Article
- ISSN
- 0305-0548
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