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A non-destructive method for the removal of residual resist in imprinted patterns

โœ Scribed by Y. Chen; D.S. Macintyre; S. Thoms


Book ID
114155614
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
417 KB
Volume
67-68
Category
Article
ISSN
0167-9317

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A method for non-destructive resistivity
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It is well known that the resistivity non-uniformity of silicon detectors is a crucial parameter when pulse-shape analysis is used to identify the charge and the mass of stopped heavy ions. In this work a method is described that allows a direct absolute resistivity measurement of the detector as a