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A new technique for producing large-area as-deposited zero-stress LPCVD polysilicon films: the MultiPoly process

✍ Scribed by Jie Yang, ; Kahn, H.; An-Qiang He, ; Phillips, S.M.; Heuer, A.H.


Book ID
121663413
Publisher
IEEE
Year
2000
Tongue
English
Weight
368 KB
Volume
9
Category
Article
ISSN
1057-7157

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