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A new soft breakdown model for thin thermal SiO2 films under constant current stress

✍ Scribed by Tomita, T.; Utsunomiya, H.; Sakura, T.; Kamakura, Y.; Taniguchi, K.


Book ID
114537531
Publisher
IEEE
Year
1999
Tongue
English
Weight
190 KB
Volume
46
Category
Article
ISSN
0018-9383

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