A new silicon nitride mask technology for synchrotron radiation x-ray lithography: First results

✍ Scribed by C.C.G. Visser; J.E. Uglow; D.W. Burns; G. Wells; R. Redaelli; F. Cerrina; H. Guckel

• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 313 KB
• Volume: 6
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(87)90053-0