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A New Microwave-Excited Plasma Etching Equipment for Separating Plasma Excited Region from Etching Process Region

✍ Scribed by Goto, Tetsuya; Hirayama, Masaki; Yamauchi, Hiroshi; Moriguchi, Makoto; Sugawa, Shigetoshi; Ohmi, Tadahiro


Book ID
111897745
Publisher
Institute of Pure and Applied Physics
Year
2003
Tongue
English
Weight
159 KB
Volume
42
Category
Article
ISSN
0021-4922

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