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A New Method of Non-Contact Measurement for Microtopography in Semiconductor Wafer Implementing a New Optical Probe Based on the Precision Defocus Measurement

โœ Scribed by H.J. Pahk; W.J. Ahn


Publisher
Springer
Year
2001
Tongue
English
Weight
546 KB
Volume
17
Category
Article
ISSN
0268-3768

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A new method of noncontact measurement f
โœ H.J Pahk; W.J Ahn ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 149 KB

In this paper, a new type of noncontact/nondestructive measuring method has been developed, comprising a new optical probe, precision stages, and controllers. The new optical probe has been designed using the reflected slit beam through the optical window. The optical measurement system has been imp