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A new method for analyzing Langmuir probe data and the determination of ion densities and etch yields in an etching plasma

โœ Scribed by Steinbruchel, Christoph


Book ID
118161130
Publisher
AVS (American Vacuum Society)
Year
1990
Tongue
English
Weight
744 KB
Volume
8
Category
Article
ISSN
0734-2101

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