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A new investigation of copper's role in enhancing Al–Cu interconnect electromigration resistance from an atomistic view

✍ Scribed by X.-Y Liu; C.-L Liu; L.J Borucki


Book ID
108492335
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
136 KB
Volume
47
Category
Article
ISSN
1359-6454

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