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A new differential stacked spiral inductor with improved self-resonance frequency

✍ Scribed by Joonchul Kim; Byungjae Nam; Hyeongdong Kim


Book ID
102517619
Publisher
John Wiley and Sons
Year
2011
Tongue
English
Weight
343 KB
Volume
53
Category
Article
ISSN
0895-2477

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✦ Synopsis


Abstract

A new silicon‐based differential stacked spiral inductor (DSSI) was implemented using a standard 0.18‐μm complimentary metal‐oxide semiconductor technology. Based on the measured two‐port S‐parameter using a standard de‐embedding procedure, the self‐resonance frequency, f~sr~, and quality factor, Q, of the new DSSI were compared with a conventional DSSI. The f~sr~ of the new DSSI was nearly twice as high as that of the conventional DSSI, and the Q value of the new DSSI was also enhanced. © 2011 Wiley Periodicals, Inc. Microwave Opt Technol Lett 53:1024–1026, 2011; View this article online at wileyonlinelibrary.com. DOI 10.1002/mop.25900


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A miniature CMOS VCO with symmetric trac
✍ Joonchul Kim; Jaeseok Lee; Byungjae Nam; Hyeongdong Kim 📂 Article 📅 2011 🏛 John Wiley and Sons 🌐 English ⚖ 515 KB

## Abstract In this study, a miniature silicon‐based symmetric trace differential stacked spiral inductor (SDSSI) was used in the design of a voltage controlled oscillator (VCO) using standard 0.18 μm CMOS technology. The SDSSI has a high self‐resonance frequency (f~sr~) and quality factor (Q) in s