## Abstract In this study, a miniature silicon‐based symmetric trace differential stacked spiral inductor (SDSSI) was used in the design of a voltage controlled oscillator (VCO) using standard 0.18 μm CMOS technology. The SDSSI has a high self‐resonance frequency (f~sr~) and quality factor (Q) in s
A new differential stacked spiral inductor with improved self-resonance frequency
✍ Scribed by Joonchul Kim; Byungjae Nam; Hyeongdong Kim
- Book ID
- 102517619
- Publisher
- John Wiley and Sons
- Year
- 2011
- Tongue
- English
- Weight
- 343 KB
- Volume
- 53
- Category
- Article
- ISSN
- 0895-2477
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✦ Synopsis
Abstract
A new silicon‐based differential stacked spiral inductor (DSSI) was implemented using a standard 0.18‐μm complimentary metal‐oxide semiconductor technology. Based on the measured two‐port S‐parameter using a standard de‐embedding procedure, the self‐resonance frequency, f~sr~, and quality factor, Q, of the new DSSI were compared with a conventional DSSI. The f~sr~ of the new DSSI was nearly twice as high as that of the conventional DSSI, and the Q value of the new DSSI was also enhanced. © 2011 Wiley Periodicals, Inc. Microwave Opt Technol Lett 53:1024–1026, 2011; View this article online at wileyonlinelibrary.com. DOI 10.1002/mop.25900
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