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A new contact plug technique for deep-submicrometer ULSI is employing selective nickel silcidation of polysilicon with a titanium nitride stopper

✍ Scribed by Iijima, T.; Nishiyama, A.; Ushiku, Y.; Ohguro, T.; Kunishima, I.; Suguro, K.; Iwai, H.


Book ID
114534994
Publisher
IEEE
Year
1993
Tongue
English
Weight
782 KB
Volume
40
Category
Article
ISSN
0018-9383

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