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A new approach to simulating n-MOSFET gate current degradation by including hot-electron induced oxide damage

✍ Scribed by Cherng-Ming Yih; Shui-Ming Cheng; Chung, S.S.


Book ID
114537479
Publisher
IEEE
Year
1998
Tongue
English
Weight
192 KB
Volume
45
Category
Article
ISSN
0018-9383

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