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A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy

✍ Scribed by U. Neuhäusler; J. Lin; A. Oelsner; M. Schicketanz; D. Valdaitsev; J. Slieh; N. Weber; M. Brzeska; A. Wonisch; T. Westerwalbesloh; A. Brechling; H. Brückl; M. Escher; M. Merkel; G. Schönhense; U. Kleineberg; U. Heinzmann


Book ID
108207556
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
251 KB
Volume
83
Category
Article
ISSN
0167-9317

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