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A new apparatus for deep patterning of beam sensitive targets by means of high-energy ion beam

✍ Scribed by A. Rovelli; A. Amato; D. Botta; A. Chiodoni; R. Gerbaldo; G. Ghigo; L. Gozzelino; F. Laviano; B. Minetti; E. Mezzetti


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
363 KB
Volume
240
Category
Article
ISSN
0168-583X

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