A new aluminum pattern formation using substitution reaction of aluminum for polysilicon and its application to MOS device fabrication

✍ Scribed by Fukuda, Y.; Kohda, S.; Kitano, Y.

• Book ID: 114594784
• Publisher: IEEE
• Year: 1984
• Tongue: English
• Weight: 763 KB
• Volume: 31
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1984.21615