𝔖 Bobbio Scriptorium
✦   LIBER   ✦

A model of strain relaxation in hetero-epitaxial films on compliant substrates

✍ Scribed by G. Kästner; U. Gösele; T.Y. Tan


Book ID
118297209
Publisher
Springer
Year
1998
Tongue
English
Weight
309 KB
Volume
66
Category
Article
ISSN
1432-0630

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Investigation of strain-relaxed SiGe thi
✍ Changchun Chen; Benhai Yu; Jiangfeng Liu; Jianqing Cao; Dezhang Zhu; Zhihong Liu 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 347 KB

Si 1Àx Ge x thin films on the Ar + ion-implanted Si substrates with different implantation energy (30 keV, 40 keV and 60 keV) at the same implantation fluence (3 • 10 15 cm À2 ) were grown by ultra high vacuum chemical vapor deposition (UHVCVD). Various characterization technologies were used to cha