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A model-based methodology for the analysis and design of atomic layer deposition processes—Part I: Mechanistic modelling of continuous flow reactors

✍ Scribed by A. Holmqvist; T. Törndahl; S. Stenström


Book ID
116355025
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
620 KB
Volume
81
Category
Article
ISSN
0009-2509

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