๐”– Bobbio Scriptorium
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A Methodology for Integrating Sustainability Considerations into Process Design

โœ Scribed by A. Azapagic; A. Millington; A. Collett


Book ID
111764272
Publisher
Institution of Chemical Engineers
Year
2006
Tongue
English
Weight
460 KB
Volume
84
Category
Article
ISSN
0263-8762

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๐Ÿ“œ SIMILAR VOLUMES


Design considerations for low damage pro
โœ M. Rahman; L.G. Deng; A. Boyd; A. Ribayrol; C.D.W. Wilkinson; J.A. van den Berg; ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 315 KB

Low ion energy is accepted as an essential requirement in achieving low damage when dry etching semiconductors. In order to investigate whether low energy is sufficient we have studied the effect of a real SiCh reactive ion etching system as well as the effect of bombardment of separate constituent