✦ LIBER ✦
A method to reduce deflection aberrations in electron-beam lithography systems.: W Knauer, J Vac Sci Technol, 19 (4), 1981, 1042–1047
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 151 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0042-207X
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