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A method for the measurement of thin film optical constants with a spectral photometer from 230 nm to 850 nm and its application to plasma silicon (oxy) nitride

✍ Scribed by R. Brendel; R. Ziegler; R. Hezel


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
665 KB
Volume
200
Category
Article
ISSN
0040-6090

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