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A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage

✍ Scribed by Fu, Yingchun; Wang, Xiaofeng; Zhang, Jiayong; Wang, Xiaodong; Chang, Chun; Ma, Huili; Cheng, Kaifang; Chen, Xiaogang; Song, Zhitang; Feng, Songlin; Ji, An; Yang, Fuhua


Book ID
118782194
Publisher
Springer
Year
2012
Tongue
English
Weight
625 KB
Volume
110
Category
Article
ISSN
1432-0630

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