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A LEED, AES and TDS study of very thin nitride film growth on Si(100) by direct thermal nitridation in NH3

✍ Scribed by A. Glachant; D. Saidi; J.F. Delord


Publisher
Elsevier Science
Year
1986
Weight
44 KB
Volume
168
Category
Article
ISSN
0167-2584

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