A laser-cooled chromium atom beam for nanolithography

✍ Scribed by Zhang Wen-tao; Li Tong-bao; Zhang Bao-wu

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 480 KB
• Volume: 256
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2006.12.032

✦ Synopsis

We have used a high collimated neutral chromium atomic beam to write periodic nanometer-scale structures by depositing an atomic beam of 52 Cr through an off-resonant laser standing wave with the wavelength of 425.55 nm onto a silicon substrate. The resulting nanolines exhibit a period of 215 ± 3 nm with a height of 1 nm, which was half the wavelength of standing wave used to write the grating.