A high-power, low-contamination laser plasma source for Extreme UV lithography

✍ Scribed by F. Bijkerk; L.A. Shmaenok; A.P. Shevelko; R.K.F.J. Bastiaensen; C. Bruineman; A.G.J.R. van Honk

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 190 KB
• Volume: 27
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(94)00111-7