Implementation of the symmetric doped do
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Joaquín Alvarado; Benjamin Iñiguez; Magali Estrada; Denis Flandre; Antonio Cerde
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Article
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2009
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John Wiley and Sons
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English
⚖ 374 KB
## Abstract Recently we developed a model for symmetric double‐gate MOSFETs (SDDGM) that, for the first time, considers the doping concentration in the Si film in the complete range from 1×10^14^ to 3×10^18^ cm^−3^. The model covers a wide range of technological parameters and includes short channe