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A facile in situ hydrophobic layer protected selective etching strategy for the synchronous synthesis/modification of hollow or rattle-type silica nanoconstructs

✍ Scribed by Zhang, Kun; Chen, Hangrong; Zheng, Yuanyi; Chen, Yu; Ma, Ming; Wang, Xia; Wang, Lijun; Zeng, Deping; Shi, Jianlin


Book ID
120176722
Publisher
Royal Society of Chemistry
Year
2012
Tongue
English
Weight
740 KB
Volume
22
Category
Article
ISSN
0959-9428

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