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A direct-write electron beam lithographic technique for the fabrication of CMOS-SOS devices with sub-micron gate dimensions

✍ Scribed by A.G. Brown; H. Willis; S.H. Mortimer; S.J. Till; F.D.J. Boller


Book ID
107920380
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
524 KB
Volume
9
Category
Article
ISSN
0167-9317

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