✦ LIBER ✦
A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method
✍ Scribed by Byong-Sun Ju; Hyoun Woo Kim
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 766 KB
- Volume
- 70
- Category
- Article
- ISSN
- 0167-9317
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✦ Synopsis
We have developed a concave-type Ru electrode capacitor to overcome the limitation of conventional stack-type capacitor in a small critical-dimension (CD) pattern. We have deposited a Ru layer on the concave-type structure made by patterning of SiO and subsequently we separated the adjacent nodes by an etch-back process with hydrogen silsesquioxane (HSQ) as a 2 protecting layer. We have summarized the issues regarding the patterning in the reactive ion etching system for fabricating the concave-type capacitor.