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A computational investigation of the effects of varying discharge geometry for an inductively coupled plasma

✍ Scribed by Christlieb, A.J.; Hitchon, W.N.G.; Keiter, E.R.


Book ID
114559134
Publisher
IEEE
Year
2000
Tongue
English
Weight
352 KB
Volume
28
Category
Article
ISSN
0093-3813

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The films were grown using an inductively coupled plasma with two different precursor gas mixtures: CH 4 /N 2 and C 10 H 16 /N 2 . The lateral compositional uniformity of the specimens and the resultant substrate coverage are investigated here using XPS, AES, Raman spectroscopy and SEM. X-ray photo