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A comparison of different methods for x-ray diffraction line broadening analysis of Ti and Ag UHV deposited thin films: nanostructural dependence on substrate temperature and film thickness

โœ Scribed by Savaloni, H; Gholipour-Shahraki, M; Player, M A


Book ID
120008428
Publisher
Institute of Physics
Year
2006
Tongue
English
Weight
405 KB
Volume
39
Category
Article
ISSN
0022-3727

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