A nuclear reaction analysis and optical
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A. Markwitz; F. Lucas; J. Rusterucci; J. Kennedy; W.J. Trompetter; M. Rudolphi;
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Article
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2006
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Elsevier Science
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English
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Ion implantation of 20 keV 12 C + ions into (1 0 0), p-type silicon with ion fluence of 8 โข 10 16 at. cm ร2 followed by an electron beam annealing under high vacuum conditions has been performed to investigate the formation of crystalline nano-scale SiC features on the silicon surface. Depending on