A comparative study of plasma enhanced chemically vapor deposited SiOH and SiNCH films using the environmentally benign precursor diethylsilane

✍ Scribed by R.A Levy; L Chen; J.M Grow; Y Yu

• Book ID: 117356655
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 118 KB
• Volume: 54
• Category: Article
• ISSN: 0167-577X
• DOI: 10.1016/s0167-577x(01)00545-6